(A Peer Review Journal)
e–ISSN: 2408–5162; p–ISSN: 2048–5170


Pages: 43-46
Ogunmola Enoch D., Adeoye Abiodun E., Ajenifuja Emmanuel, Taleatu Bidini A, Omotoso Ezekiel

keywords: Titanium dioxide, thin films, MOCVD, coatings, micrograph, optical properties


Thin films of TiO2 were prepared on glass substrates at varied deposition temperature using metal-organic liquid precursor by simple chemical vapor deposition technique. The deposition process was carried out at 350, 380, 420 and 480oC for samples TiOT1, TiOT2, TiOT3 and TiOT4, respectively. Characterizations of the films were carried out using UV-Vis-NIR spectrophotometry, field emission scanning electron microscopy (FE-SEM), energy dispersive x-ray spectroscopy and Sign at one four-point probe coupled with Keithley source meter 2400. The uv-visible optical studies revealed that the films transmitted between 65 and 85% mainly in the visible region. Hence, depending on deposition temperatures, energy band gap values between 1.53 and 3.26 eV were obtained. Refractive indices were also estimated between 2.55 and 3.50. Estimating from the sectional FE-SEM analysis, slight differences in the film thickness was observed. Film thickness in the range of 131.11–132.01 nm was determined. Sheet resistivity of the films ranged between 596.32 to 7694.79 Ωm


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